Micro- And Nano-fabrication By Metal Assisted Chemical Etching - MDPI AG

Metal-assisted Chemical Etching (macetch) Has Recently Emerged As A Etching Technique Capable Of Fabricating High Aspect Ratio Nano- And Microstructures In A Few Semiconductors Substrates-si, Ge, Poly-si, Gaas, And Sic-and Using Different Catalysts-ag, Au, Pt, Pd, Cu, Ni, And Rh. Several Shapes Have Been Demonstrated With A High Anisotropy And Feature Size In The Nanoscale-nanoporous Films, Nanowires, 3d Objects, And Trenches, Which Are Useful Components Of Photonic Devices, Microfluidic Devices, Bio-medical Devices, Batteries, Vias, Mems, X-ray Optics, Etc. With No Limitations Of Large-areas And Low-cost Processing, Macetch Can Open Up Opportunities For Several Applications Where High Precision Nano- And Microfabrication Is Required.