Sub-half-micron Lithography For Ulsis
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Sub-half-micron Lithography For Ulsis
This Book Describes Advanced Techniques Under Development In Japan And Elsewhere That Represent The Key To Future Semiconductor-device Fabrication. Several Important Lithography Methods, Such As Deep Uv, X-ray, Electron-beam, And Focused Ion-beam Lithography Are Described In Detail By Experts. The Principles Underlying Each Of The Techniques Are Illustrated At The Beginning Of Each Chapter.
- 品牌: Cambridge University Press
- 类别: 计算机与互联网
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语言: English
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作者: Cambridge University Press
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出版日期: 2005-10-24
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页数: 344
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出版社／标签: Cambridge University Press
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格式: Paperback
- Fruugo ID: 556915898-1125149444
- ISBN: 9780521022347
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